# Erik Langereis

**Source**: https://www.tue.nl/en/research/researchers/erik-langereis
**Parent**: https://www.tue.nl/en/education/bachelor-college/bachelor-applied-physics

University Lecturer

# Erik Langereis

- [PURE url](https://research.tue.nl/en/persons/erik-langereis/ "Research Portal")

##### Contact

[e.langereis@tue.nl](#)

[Flux 3.083](https://www.google.com/maps/dir/?api=1&destination=51.447193,5.491892)

##### Department / Institute

[Applied Physics and Science Education](https://www.tue.nl/en/our-university/departments/applied-physics-and-science-education)

##### Group

[Plasma & Materials Processing](https://www.tue.nl/en/research/research-groups/plasma-materials-processing)

## RESEARCH PROFILE

Starting April 2023, Erik Langereis works as University Lecturer at the department of Applied Physics & Science Education. Having obtained his PhD on research of Plasma-Assisted Atomic Layer Deposition (2008) as a versatile technique to deposit ultrathin films with ultimate control and conformality, he now is back at the department to fully focus on education and teaching. And with a drive to find inspiring ways to link the departmental research to the several bachelor courses.

> With my enthusiam and fascination for physics and education, I like to train the next-generation TU/e professionals in recognizing the value of physics understanding for their careers. Hope to clearly integrate and connect to inspiring research and innovation at TU/e.

## Recent Publications

- [See all publications](https://research.tue.nl/en/persons/erik-langereis//publications/)

- [### Dielectric material options for integrated capacitors

  ECS Journal of Solid State Science and Technology

  (2014)

  G. Ruhl,W. Lehnert,M. Lukosius,C. Wenger,C. Baristiran Kaynak,T. Blomberg,S. Haukka,P.K. Baumann,W.F.A. Besling,A.L. Roest](https://research.tue.nl/nl/publications/8b003621-69a1-40e9-80cc-8be45bf67d39)
- [### Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas

  Journal of Vacuum Science and Technology A

  (2012)

  H.C.M. Knoops,E. Langereis,M.C.M. Sanden, van de,W.M.M. Kessels](https://research.tue.nl/nl/publications/0821c992-78c9-456f-ba43-171f4f29e65e)
- [### Atomic layer deposition of Ru from CpRu(CO2)Et using O2 gas and O2 plasma

  Journal of Vacuum Science and Technology A

  (2011)

  N. Leick,R.O.F. Verkuijlen,L. Lamagna,E. Langereis,S.A. Rushworth,F. Roozeboom,M.C.M. Sanden, van de,W.M.M. Kessels](https://research.tue.nl/nl/publications/2afdcf0b-2817-4f89-9aab-b1e874920402)
- [### Remote plasma ALD of SrTiO3 using cyclopentadienlyl-based Ti and Sr precursors

  Journal of the Electrochemical Society

  (2011)

  E. Langereis,R.F.H. Roijmans,F. Roozeboom,M.C.M. Sanden, van de,W.M.M. Kessels](https://research.tue.nl/nl/publications/2aef9169-4040-4f5f-8ed9-959c68659287)
- [### Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films

  Journal of the Electrochemical Society

  (2010)

  S.E. Potts,W. Keuning,E. Langereis,G. Dingemans,M.C.M. Sanden, van de,W.M.M. Kessels](https://research.tue.nl/nl/publications/d7433941-f8ca-4ef8-85c5-b007d941f750)

## Ancillary Activities

No ancillary activities